• Instrumentation for Industry

Chemical Resistance of E+E Humidity Sensors

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Chemical Resistance of E+E Humidity Sensors

Chemical Resistance of E+E Humidity Sensors

E+E humidity sensors are built for reliable operation in environments exposed to various industrial gases and chemicals. They are tested against substances like carbon monoxide, ammonia, sulfur dioxide, chlorine, and common cleaning alcohols, typically up to defined Maximum Acceptable Concentrations (MAC). However, highly corrosive gases such as hydrogen chloride (HCl) and hydrogen fluoride (HF) can negatively affect performance. Protective design features, including shielding against UV radiation, help maintain sensor accuracy and durability in harsh conditions.

 

Chemical Gas
Concentration		 Harmless Negative
Effect
carbon monoxide CO up to 400 ppm X
ammonia-NH3 up to 500 ppm X
sulphur dioxide-SO2 up to 100 ppm X
formaldehyde-HCHO up to 10 x MAC X
Freon 113-C2Cl3F3 X
chlorine-Cl2 up to 10 x MAC X
hydrogen chloride-HCL X
hydrogen fluoride-HF X
nitrogen dioxide-NO2 up to 20 x MAC X
ethanol-CH3CH2OH(liquid: for cleaning; gas: harmless) X
methanol-CH3OH(liquid: for cleaning; gas: harmless) X
ozone-O3 up to 10 x MAC X
ultraviolet rays (at 300-400 nm & 2 J/cm² / time of exposure: approx. 5 minutes) Sensitive area of the sensor surface is protected by a metallic layer X
Isopropanol-(CH3)2CHOH(liquid: for cleaning; gas: harmless) X
chlorine methane – CH3CL X
ethylene oxide-C2H4O up to 15% X
hydrogen peroxide H2O2 up to 10 x MAC X

MAC = Maximum Acceptable Concentration

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